On 4-9 May 2024, Conference on Lasers and Electro-Optics (CLEO) took place in California. CLEO is the premier international forum for scientific and technical optics, uniting the fields of lasers and opto-electronics by bringing together all aspects of laser technology, from basic research to industry applications.
Our Coordinator, Martijn Heck, gave an invited talk within the special symposium entitled „3-D Horizons in Photonics: Unraveling the Next Frontier of Integrated Circuits“.
The session was dedicated to exploration of the challenges related to transition from 2-D to 3-D fabrication processes and its impact on future PICs, and also the broader IC industry: how does the convergence of mature CMOS processes with new 3-D design philosophies impact scalability, efficiency, and performance? And as the line between electronic and photonic circuits becomes increasingly blurred, how do we navigate the challenges while harnessing the unparalleled opportunities?
Martijn’s contribution focused on Wafer-scale Heterogeneous Integration for Integrated Photonics.
INSPIRE was presented as a cutting-edge project leveraging micro-transfer printing as large volume manufacturing technique for InP/SiN PICs, aiming to revolutionize the PIC manufacturing.