INSPIRE aims to revolutionize photonic integrated circuit technology by combining two technologies, InP photonics and SiN photonics, in a single platform through wafer-scale micro-transfer printing technology.
WHY
TRANSFER PRINTING
WILL
Sustain Europe’s industrial leadership in photonics by combining the generic integrated foundry technology at the pioneering pure-play foundry SPH, and the silicon photonics pioneer IMEC, with the micro-transfer printing technology developed at XCEL. This would be a world-first platform combining the strengths to create best-in-class PIC manufacturing. Furthermore, INSPIRE will strengthen the European manufacturing base by developing and implementing processing steps that are key to removing expensive assembly steps in PIC-based product realization. The methods will be developed for silicon nitride – indium phosphide integration. Since the optical coupling happens through a silicon intermediate layer (see above) the developed technology can be further ported to silicon CMOS photonics as well. INSPIRE will connect state-of-the-art manufacturing capability to leading-edge applications and also to industry clusters through JePPIX, ePIXfab and the EC manufacturing pilot lines.
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Overview
INSPIRE combines the power of indium phosphide technology with the full capability of silicon nitride photonic technology, creating and leveraging volume manufacturing techniques.
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Objectives
INSPIRE will ensure scalability by enabling low-cost manufacturing of photonic integrated circuits (PICs).
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Inspire applications
ROAD MAP – our technology will be usable for various markets.
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Results
Publicly available deliverables, publications, press releases, downloads & gallery available for a view and download.
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